With her WISE Fellowship, Olsson and her team will conduct atomic-scale modeling of solid-state materials to explore and design materials for EUV lithography. Directly probing the materials properties and mechanisms that lead to enhanced and limited performance is challenging. Therefore, the group will develop a computational framework to probe the effect of initial surface structure and deposition on interface formation. These models will allow degradation pathways to be explored at different interface systems, permitting for mitigation and optimisation. Olsson says: “the WISE Fellowship allows us to build an ambitious research project to develop an atomistic understanding of interfacial phenomena in current EUV lithography bottlenecks and future technologies.”