Opening Advanced Research Center for Nanolithography

27 October 2014

On Tuesday, 11 November 2014, the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam will be officially opened by Sander Dekker, State Secretary for Education, Culture and Science, and Martin van den Brink, ASML President and Chief Technology Officer.

The Advanced Research Center for Nanolithography (ARCNL) is a public-private partnership between the Foundation for Fundamental Research on Matter (FOM), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and ASML, manufacturer of lithography equipment for the chip industry.

Fundamental physics

On 1 January 2014 ARCNL kicked-off with Professor Joost Frenken as its director. ARCNL focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. A significant part of the initial program is devoted to the physics that is central in the generation of high intensities of extreme ultraviolet light and its use in nanolithography. To date, five research groups have started, the first researchers have been hired and the lab equipment is almost ready.


An ‘Advanced Research Center’ is a new type of collaboration, used by NWO as an impetus for collaboration between universities and private parties. The private and public parties contribute each 50% of the base funding; the City of Amsterdam and the Province of Noord-Holland provide additional financial support. During a short, initial phase, ARCNL formally operates as a department of the FOM Institute AMOLF. After this phase it will operate as an independent research center, staffed by approximately one hundred scientists and technical support staff. ARCNL is managed by FOM under the auspices of the Netherlands Organisation for Scientific Research (NWO) and is located at the Amsterdam Science Park.

Published by  Faculty of Science